Heidelberg Instruments, GmbH, Installs A DWL66 Maskless Lithography System at the Naval Research Laboratory, USA
9 October 2005
Heidelberg Instruments, GmbH, Heidelberg, Germany, announced the installation of a DWL66 maskless lithography system at the Naval Research Laboratory, Institute of Nanosciences, Washington DC, USA.
The DWL66 is a unique, maskless lithography system for mask making and direct writing. This system is capable of producing patterns down to 0.6 microns, and is equipped with the capability of thick resist and grey scale exposure, in addition to metrology, front to backside and layer to layer alignment
"As part of our ongoing enhancement to the equipment capabilities we have recently purchased and installed a Heidelberg DWL-66 Laser Pattern Generator (HLPG). The DWL-66 allows researchers to design and fabricate wafer masks in-house, eliminating the long turnaround time normally required when working with outside sources. Furthermore, the DWL-66 is capable of writing directly to a wafer. This capability is crucial for direct writing of microstructures dedicated to interfacing nanodevices fabricated by e-beam lithography. Our experience working with the DWL-66 and with Heidelberg Instruments has been superb,” said Mr. Darrel King, Naval Research Laboratory.
About Naval Research Laboratory, Institute for Nanosciences: In 2001 The Naval Research Laboratory (NRL), located in Washington, DC, established an Institute for Nanoscience (NSI) to conduct multidisciplinary research at the intersection of the fields of materials, electronics, biology and chemistry at the nanometer length scale. The Institute serves as NRL’s nucleus of collaborative activity in this rapidly evolving research area. The NSI is seen as a venue to bring together scientists with disparate training and backgrounds to attack common goals at the intersection of their common fields. In support of this effort, in October 2003 NRL opened a new NSI building which houses a 5000 square foot class 100 cleanroom and 5000 square feet of Quiet and Ultra-Quiet laboratory space. The class 100 cleanroom is outfitted as a device fabrication facility and is available for all NRL researchers to use.
About Heidelberg Instruments, GmbH: With an installation base in over 20 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems capable of exposing substrates up to 2.4 meter by 1.9 meter. These systems are used for direct writing and photomask production, in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other exciting applications.
Heidelberg Instruments, GmbH
Alexander Forozan
VP, Sales and Marketing
Phone: +49 6221 3430 73
www.himt.de
Source: PR Web
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